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Description of SISP functionality
SISP's layout tool can generate spiral inductor structures or alternatively import layout designs in CIF format. The designer should enter the CMOS, BiCMOS or bipolar process parameters before creating a layout. A fast, segment by segment extraction of the equivalent SPICE subcircuit is executed within seconds, while a similar model extraction with any EM software would take days. Three distinct versions of the model are produced to accommodate "typical", "fast" and "slow" technology variations. Passive elements may be frequency- dependent, to incorporate conductor skin effect, if supported by the SPICE simulator being used. Simulations can be initiated through the user-interface. The software displays simulation results in rectangular, polar or Smith chart plots, against measurement results (from S-parameter sets), if any. |